Invention Grant
- Patent Title: Micromechanical device and method of manufacturing micromechanical device
- Patent Title (中): 微机械装置及其制造方法
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Application No.: US12399348Application Date: 2009-03-06
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Publication No.: US07972884B2Publication Date: 2011-07-05
- Inventor: Susumu Obata , Michinobu Inoue , Takeshi Miyagi
- Applicant: Susumu Obata , Michinobu Inoue , Takeshi Miyagi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-071571 20080319
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An example of the present invention is a micromechanical device including, a substrate in which a signal line is provided, a micromachine which is mounted on the substrate, is formed of a conductive material into a beam-like shape, is elastically deformed by a function of an electric field in such a manner that the beam-like part moves closer to or apart from the signal line, and changes the electric characteristics concomitantly with the deformation, a deformation restraint section constituted of a material having a higher viscosity coefficient than the conductive material, provided on the opposite side of the micromachine to the signal line, for restraining deformation of the micromachine in a direction in which the micromachine is separated from the signal line, and a sealing body provided on the principal surface of the substrate, for covering the micromachine with a hollow section located therebetween.
Public/Granted literature
- US20090236114A1 MICROMECHANICAL DEVICE AND METHOD OF MANUFACTURING MICROMECHANICAL DEVICE Public/Granted day:2009-09-24
Information query
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