Invention Grant
- Patent Title: Method of manufacturing micro electro mechanical systems device
- Patent Title (中): 微机电系统装置的制造方法
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Application No.: US12143372Application Date: 2008-06-20
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Publication No.: US07972886B2Publication Date: 2011-07-05
- Inventor: Heewon Jeong , Yasushi Goto , Yuko Hanaoka , Tsukasa Fujimori
- Applicant: Heewon Jeong , Yasushi Goto , Yuko Hanaoka , Tsukasa Fujimori
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2007-183159 20070712
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided is a MEMS device which is robust to the misalignment and does not require the double-side wafer processing in the manufacture of a MEMS device such as an angular velocity sensor, an acceleration sensor, a combined sensor or a micromirror. After preparing a substrate having a space therein, holes are formed in a device layer at positions where fixed components such as a fixing portion, a terminal portion and a base that are fixed to a supporting substrate are to be formed, and the holes are filled with a fixing material so that the fixing material reaches the supporting substrate, thereby fixing the device layer around the holes to the supporting substrate.
Public/Granted literature
- US20090017579A1 METHOD OF MANUFACTURING MICRO ELECTRO MECHANICAL SYSTEMS DEVICE Public/Granted day:2009-01-15
Information query
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