Invention Grant
- Patent Title: Micro-electro-mechanical-system package and method for manufacturing the same
- Patent Title (中): 微机电系统封装及其制造方法
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Application No.: US12252830Application Date: 2008-10-16
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Publication No.: US07972887B2Publication Date: 2011-07-05
- Inventor: Yoshiaki Shimooka
- Applicant: Yoshiaki Shimooka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPP2007-270449 20071017
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
According to an aspect of the present invention, there is provided a method for manufacturing a MEMS package, the method including: forming a MEMS device on a substrate; forming a sacrificing member on the MEMS device; forming a cavity formation film on the sacrificing member; forming a through hole in the cavity formation film at a portion other than above the MEMS device; removing the sacrificing member through the through hole, thereby forming a cavity around the MEMS device; and forming a seal layer on the cavity formation film to block the through hole and to seal the cavity, by performing a film forming process in which a seal layer material is straightly applied in a direction of perpendicular to a surface of the substrate.
Public/Granted literature
- US20090107692A1 MICRO-ELECTRO-MECHANICAL-SYSTEM PACKAGE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2009-04-30
Information query
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