Invention Grant
- Patent Title: Image sensor and method for manufacturing the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12252461Application Date: 2008-10-16
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Publication No.: US07972891B2Publication Date: 2011-07-05
- Inventor: Jin-Ho Park
- Applicant: Jin-Ho Park
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2007-0105940 20071022
- Main IPC: H01L31/0232
- IPC: H01L31/0232

Abstract:
An image sensor and a method for manufacturing the same that includes photodiodes formed in a semiconductor substrate, a first insulating layer formed over the semiconductor substrate, the first insulating layer including a seed pattern corresponding spatially to the positions of the photodiodes, lower microlenses composed of an organic material formed over the seed pattern, a second insulating layer formed over the lower microlenses, a third insulating layer formed over the second insulating layer, color filters formed over the third insulating layer, and upper micro lenses formed over the color filters.
Public/Granted literature
- US20090101952A1 IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2009-04-23
Information query
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