Invention Grant
- Patent Title: Process for production of halogen-substituted benzenedimethanol
- Patent Title (中): 制备卤素取代苯二甲醇的方法
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Application No.: US12303585Application Date: 2007-06-21
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Publication No.: US07973201B2Publication Date: 2011-07-05
- Inventor: Koji Hagiya
- Applicant: Koji Hagiya
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-176479 20060627
- International Application: PCT/JP2007/062951 WO 20070621
- International Announcement: WO2008/001826 WO 20080103
- Main IPC: C07C33/28
- IPC: C07C33/28 ; C07C29/136

Abstract:
A process for the production of a halogen-substituted benzenedimethanol represented by the formula (2): wherein X1, X2, X3 and X4 are the same or different and independently represent a hydrogen atom or a halogen atom, provided that at least one of X1, X2, X3 and X4 represents a halogen atom, comprising reacting a halogen-substituted terephthalic acid diester represented by the formula (1): wherein X1, X2, X3 and X4 are the same meanings as defined above and R1 and R2 are the same or different and independently represent an unsubstituted or substituted alkyl group, a metal borohydride compound and an acid in the presence of an ether solvent, wherein the amount of the acid is 0.2 to 3 moles per 1 mole of the metal borohydride compound based on protons, and the reaction is conducted under the condition where the liquid phase of the reaction mixture is a single layer.
Public/Granted literature
- US20100174122A1 PROCESS FOR PRODUCTION OF HALOGEN-SUBSTITUTED BENZENEDIMETHANOL Public/Granted day:2010-07-08
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