Invention Grant
- Patent Title: Charged particle beam apparatus and dimension measuring method
- Patent Title (中): 带电粒子束装置和尺寸测量方法
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Application No.: US11723457Application Date: 2007-03-20
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Publication No.: US07973282B2Publication Date: 2011-07-05
- Inventor: Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
- Applicant: Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-292772 20041005
- Main IPC: H01J37/21
- IPC: H01J37/21 ; G01N21/00 ; G01N23/00

Abstract:
There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.
Public/Granted literature
- US20080100832A1 Charged particle beam apparatus and dimension measuring method Public/Granted day:2008-05-01
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