Invention Grant
- Patent Title: Hetero junction field effect transistor and method of fabricating the same
- Patent Title (中): 异质结场效应晶体管及其制造方法
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Application No.: US12507604Application Date: 2009-07-22
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Publication No.: US07973338B2Publication Date: 2011-07-05
- Inventor: Nobuaki Teraguchi
- Applicant: Nobuaki Teraguchi
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-176347 20060627
- Main IPC: H01L29/08
- IPC: H01L29/08

Abstract:
There is provided a hetero junction field effect transistor including: a first layer of a nitride based, group III-V compound semiconductor; a second layer of a nitride based, group III-V compound semiconductor containing a rare earth element, overlying the first layer; a pair of third layers of a nitride based, group III-V compound semiconductor, overlying the second layer, the third layers being spaced from each other; a gate electrode disposed between the third layers at least a region of the second layer; and a source electrode overlying one of the third layers and a drain electrode overlying an other of the third layers. A method of fabricating the hetero junction field effect transistor is also provided.
Public/Granted literature
- US20100012924A1 HETERO JUNCTION FIELD EFFECT TRANSISTOR AND METHOD OF FABRICATING THE SAME Public/Granted day:2010-01-21
Information query
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