Invention Grant
- Patent Title: Method of manufacturing a substrate for a liquid crystal display device
- Patent Title (中): 制造液晶显示装置用基板的方法
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Application No.: US12323843Application Date: 2008-11-26
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Publication No.: US07973893B2Publication Date: 2011-07-05
- Inventor: Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
- Applicant: Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2001-016882 20010125; JP2001-101755 20010330; JP2002-318657 20021031
- Main IPC: G02F1/1335
- IPC: G02F1/1335

Abstract:
The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
Public/Granted literature
- US20090148616A1 REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-06-11
Information query
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