Invention Grant
- Patent Title: Optical inspection method and optical inspection apparatus
- Patent Title (中): 光学检测方法和光学检测仪器
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Application No.: US12556144Application Date: 2009-09-09
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Publication No.: US07973922B2Publication Date: 2011-07-05
- Inventor: Shigeru Matsui
- Applicant: Shigeru Matsui
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tecnologies Corporation
- Current Assignee: Hitachi High-Tecnologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-137212 20060517
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.
Public/Granted literature
- US20090323051A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION APPARATUS Public/Granted day:2009-12-31
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