Invention Grant
- Patent Title: Plane waves to control critical dimension
- Patent Title (中): 平面波来控制关键维度
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Application No.: US12316711Application Date: 2008-12-16
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Publication No.: US07974027B2Publication Date: 2011-07-05
- Inventor: Peng Liu
- Applicant: Peng Liu
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Winkle, PLLC
- Main IPC: G02B5/00
- IPC: G02B5/00

Abstract:
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other.The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.
Public/Granted literature
- US20090097147A1 Plane waves to control critical dimension Public/Granted day:2009-04-16
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