Invention Grant
US07974027B2 Plane waves to control critical dimension 有权
平面波来控制关键维度

  • Patent Title: Plane waves to control critical dimension
  • Patent Title (中): 平面波来控制关键维度
  • Application No.: US12316711
    Application Date: 2008-12-16
  • Publication No.: US07974027B2
    Publication Date: 2011-07-05
  • Inventor: Peng Liu
  • Applicant: Peng Liu
  • Applicant Address: US CA Santa Clara
  • Assignee: Intel Corporation
  • Current Assignee: Intel Corporation
  • Current Assignee Address: US CA Santa Clara
  • Agency: Winkle, PLLC
  • Main IPC: G02B5/00
  • IPC: G02B5/00
Plane waves to control critical dimension
Abstract:
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other.The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.
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