Invention Grant
- Patent Title: Staged scenario generation
- Patent Title (中): 分阶段生成
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Application No.: US11949187Application Date: 2007-12-03
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Publication No.: US07975248B2Publication Date: 2011-07-05
- Inventor: Sidhesh Patel , Prakash Bodhak
- Applicant: Sidhesh Patel , Prakash Bodhak
- Applicant Address: US CA Milpitas
- Assignee: LSI Corporation
- Current Assignee: LSI Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Luedeka, Neely & Graham, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method of verifying integrated circuit designs, by constructing a series of atomic generators in a staged, hierarchical order, applying a lowest of the hierarchical generator stages to device level test cases of the verification process, applying a highest of the hierarchical generator stages to system level test cases of the verification process, reusing code written for and used in the lowest hierarchical generator stage in a next higher generator stage, creating a constraint scenario in the highest hierarchical generator stage, and injecting the constraint scenario into a next lower generator stage.
Public/Granted literature
- US20090144679A1 Staged Scenario Generation Public/Granted day:2009-06-04
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