Invention Grant
- Patent Title: Chamber replacing method
- Patent Title (中): 室更换方法
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Application No.: US11984292Application Date: 2007-11-15
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Publication No.: US07984539B2Publication Date: 2011-07-26
- Inventor: Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
- Applicant: Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
- Applicant Address: JP Tochigi JP Tokyo JP Tokyo
- Assignee: Gigaphoton Inc.,Komatsu Ltd.,Ushio Denki Kabushiki Kaisha
- Current Assignee: Gigaphoton Inc.,Komatsu Ltd.,Ushio Denki Kabushiki Kaisha
- Current Assignee Address: JP Tochigi JP Tokyo JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2006-310317 20061116
- Main IPC: B29C73/00
- IPC: B29C73/00

Abstract:
When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
Public/Granted literature
- US20080115342A1 Chamber replacing method Public/Granted day:2008-05-22
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