Invention Grant
- Patent Title: Printhead nozzle cell having photoresist chamber
- Patent Title (中): 具有光致抗蚀剂室的打印头喷嘴单元
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Application No.: US12711260Application Date: 2010-02-24
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Publication No.: US07984975B2Publication Date: 2011-07-26
- Inventor: Kia Silverbrook
- Applicant: Kia Silverbrook
- Applicant Address: AU Balmain, New South Wales
- Assignee: Silverbrook Research Pty Ltd
- Current Assignee: Silverbrook Research Pty Ltd
- Current Assignee Address: AU Balmain, New South Wales
- Main IPC: B41J2/05
- IPC: B41J2/05

Abstract:
A nozzle cell of a printhead is provided which has a multi-layer substrate defining a fluid inlet, side walls extending from the substrate around the fluid inlet and comprising walls of silicon nitride encapsulating hardened photoresist, an apertured roof supported by the side walls to define a chamber, and a heater within the chamber, the heater heating the fluid in the chamber so that bubbles are generated therein to cause ejection of the fluid from a nozzle defined with the apertured roof.
Public/Granted literature
- US20100149282A1 PRINTHEAD NOZZLE CELL HAVING PHOTORESIST CHAMBER Public/Granted day:2010-06-17
Information query
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