Invention Grant
US07985219B2 Irradiation device and method for the treatment of acne and acne scars
失效
用于治疗痤疮和痤疮疤痕的照射装置和方法
- Patent Title: Irradiation device and method for the treatment of acne and acne scars
- Patent Title (中): 用于治疗痤疮和痤疮疤痕的照射装置和方法
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Application No.: US10094431Application Date: 2002-03-08
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Publication No.: US07985219B2Publication Date: 2011-07-26
- Inventor: Jan Hennrik Wilkens , Rolf Stirner
- Applicant: Jan Hennrik Wilkens , Rolf Stirner
- Applicant Address: DE Berlin
- Assignee: Spectrometric Optoelectronic Systems GmbH
- Current Assignee: Spectrometric Optoelectronic Systems GmbH
- Current Assignee Address: DE Berlin
- Agency: Harding, Earley, Follmer & Frailey, P.C.
- Agent Frank J. Bonini, Jr.; John F. A. Earley, III
- Priority: DE20109899 20010308; DE10123926 20010510
- Main IPC: A61B18/18
- IPC: A61B18/18
Abstract:
An irradiation device (1) and a method for the treatment of acne and acne scars, comprising at least one source of radiation (2), the source of radiation emitting at least one broadband spectrum in the wavelength range of 320-at least 540 nm and the radiation source (2) being pulseoperable and/or movable relatively to the area to be irradiated, the pulse energy being between 0.05-10 J/cm2 and the peak irradiation intensity being between 0.5 W/cm2 and 100 kW/cm2.
Public/Granted literature
- US20030004501A1 Irradiation device and method for the treatment of acne and acne scars Public/Granted day:2003-01-02
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