Invention Grant
- Patent Title: Electroless gold plating bath, electroless gold plating method and electronic parts
- Patent Title (中): 化学镀金,化学镀金方法及电子零件
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Application No.: US11987880Application Date: 2007-12-05
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Publication No.: US07985285B2Publication Date: 2011-07-26
- Inventor: Masayuki Kiso , Yukinori Oda , Seigo Kurosaka , Tohru Kamitamari , Yoshikazu Saijo , Katsuhisa Tanabe
- Applicant: Masayuki Kiso , Yukinori Oda , Seigo Kurosaka , Tohru Kamitamari , Yoshikazu Saijo , Katsuhisa Tanabe
- Applicant Address: JP Osaka-Shi
- Assignee: C. Uyemura & Co., Ltd.
- Current Assignee: C. Uyemura & Co., Ltd.
- Current Assignee Address: JP Osaka-Shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-328891 20061206
- Main IPC: C23C18/44
- IPC: C23C18/44 ; B05D1/18

Abstract:
An electroless gold plating bath includes a water-soluble gold compound, a complexing agent, a formaldehyde metabisulfite adduct, and an amine compound represented by R1—NH—C2H4—NH—R2 or (CH2—NH—C2H4—NH—CH2)n—R4 (wherein R1 to R4 represent —OH, —CH3, —CH2OH, —C2H4OH, —CH2N(CH3)2, —CH2NH(CH2OH), —CH2NH(C2H4OH), —C2H4NH(CH2OH), —C2H4NH(C2H4OH), —CH2N(CH2OH)2, —CH2N(C2H4OH)2, —C2H4N(CH2OH)2 or —C2H4N(C2H4OH)2, and n is an integer of 1 to 4). A gold plated coating of a good appearance can be formed without causing a failure in appearance owing to the progress of intergranular corrosion in a nickel surface.
Public/Granted literature
- US20080138506A1 Electroless gold plating bath, electroless gold plating method and electronic parts Public/Granted day:2008-06-12
Information query
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