Invention Grant
- Patent Title: Systems and methods for nanowire growth and manufacturing
- Patent Title (中): 纳米线生长和制造的系统和方法
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Application No.: US12236209Application Date: 2008-09-23
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Publication No.: US07985454B2Publication Date: 2011-07-26
- Inventor: Chunming Niu , Jay L. Goldman , Xiangfeng Duan , Vijendra Sahi
- Applicant: Chunming Niu , Jay L. Goldman , Xiangfeng Duan , Vijendra Sahi
- Applicant Address: US CA Palo Alto
- Assignee: Nanosys, Inc.
- Current Assignee: Nanosys, Inc.
- Current Assignee Address: US CA Palo Alto
- Agent Andrew L. Filler
- Main IPC: B05D1/38
- IPC: B05D1/38

Abstract:
The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a method to produce a catalytic-coated nanowire growth substrate for nanowire growth is disclosed which comprises: (a) depositing a buffer layer on a substrate; (b) treating the buffer layer with boiled water or steam to enhance interactions between the buffer layer and catalyst particles; and (c) depositing catalytic particles on a surface of the buffer layer. Methods to develop and use this catalytic-coated nanowire growth substrate are disclosed.
Public/Granted literature
- US20100279513A1 Systems and Methods for Nanowire Growth and Manufacturing Public/Granted day:2010-11-04
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