Invention Grant
- Patent Title: Diamond sintered compact
- Patent Title (中): 金刚石烧结体
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Application No.: US11886433Application Date: 2007-02-02
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Publication No.: US07985470B2Publication Date: 2011-07-26
- Inventor: Yoshihiro Kuroda , Satoru Kukino , Tomohiro Fukaya
- Applicant: Yoshihiro Kuroda , Satoru Kukino , Tomohiro Fukaya
- Applicant Address: JP Hyogo
- Assignee: Sumitomo Electric Hardmetal Corp.
- Current Assignee: Sumitomo Electric Hardmetal Corp.
- Current Assignee Address: JP Hyogo
- Agency: McDermott Will & Emery LLP
- International Application: PCT/JP2007/051825 WO 20070202
- International Announcement: WO2008/096402 WO 20080814
- Main IPC: B23B27/00
- IPC: B23B27/00

Abstract:
An object is to raise both the wear resistance and chipping resistance of diamond sintered compacts while taking advantage of the characteristics of highly chipping-resistant microfine-grain diamond sintered compacts. A sintered diamond layer 3 is formed by sintering diamond grains and a binder on a cemented carbide substrate 2. This sintered diamond layer 3 comprises a main diamond layer 4 and a Co-rich diamond layer 5 that is present between the main diamond layer 4 and the cemented carbide substrate 2 and that has a Co content larger than that of the main diamond layer 4; the main diamond layer has a residual compressive stress of 1.5 GPa to 3 GPa.
Public/Granted literature
- US20090208301A1 Diamond Sintered Compact Public/Granted day:2009-08-20
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