Invention Grant
US07985646B2 Method of fabricating nanowire memory device and system of controlling nanowire formation used in the same
有权
制造纳米线存储器件的方法及其中使用的纳米线形成控制系统
- Patent Title: Method of fabricating nanowire memory device and system of controlling nanowire formation used in the same
- Patent Title (中): 制造纳米线存储器件的方法及其中使用的纳米线形成控制系统
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Application No.: US11712990Application Date: 2007-03-02
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Publication No.: US07985646B2Publication Date: 2011-07-26
- Inventor: Jin-gyoo Yoo , Cheol-soon Kim , Jung-hoon Lee
- Applicant: Jin-gyoo Yoo , Cheol-soon Kim , Jung-hoon Lee
- Applicant Address: KR Suwon-si KR Seoul
- Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee Address: KR Suwon-si KR Seoul
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2006-0022322 20060309
- Main IPC: G11C11/50
- IPC: G11C11/50

Abstract:
A method of fabricating a nanowire memory device, and a system of controlling nanowire formation used in the same method are provided. In the method of fabricating a nanowire memory device which includes a substrate; an electrode formed on the substrate and insulated from the substrate; and a nanowire having its one end connected with the electrode and formed at a given length, the method comprises: forming an electrode and a dummy electrode to be paired with the electrode on the substrate; forming the nanowire between the electrode and the dummy electrode while measuring a current flowing between the electrode and the dummy electrode, and cutting power applied between the electrode and the dummy electrode when the current measured is a given value; and removing the dummy electrode.
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