Invention Grant
- Patent Title: Method for reducing stray light in a rapid thermal processing chamber by polarization
- Patent Title (中): 通过极化减少快速热处理室中杂散光的方法
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Application No.: US12118497Application Date: 2008-05-09
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Publication No.: US07985945B2Publication Date: 2011-07-26
- Inventor: Blake Koelmel , Joseph Michael Ranish , Aaron Hunter
- Applicant: Blake Koelmel , Joseph Michael Ranish , Aaron Hunter
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, L.L.P.
- Main IPC: A21B1/00
- IPC: A21B1/00 ; F26B3/30

Abstract:
Embodiments of the present invention provide apparatus and method for reducing noises in temperature measurement during thermal processing. One embodiment of the present invention provides a chamber for processing a substrate comprising a chamber enclosure defining a processing volume, an energy source configured to direct radiant energy toward the processing volume, a spectral device configured to treat the radiant energy directed from the energy source towards the processing volume, a substrate support disposed in the processing volume and configured to support the substrate during processing, and a sensor assembly configured to measure temperature of the substrate being processed by sensing radiation from the substrate within a selected spectrum.
Public/Granted literature
- US20090277894A1 METHOD FOR REDUCING STRAY LIGHT IN A RAPID THERMAL PROCESSING CHAMBER BY POLARIZATION Public/Granted day:2009-11-12
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