Invention Grant
- Patent Title: Nitride semiconductor light emitting element
- Patent Title (中): 氮化物半导体发光元件
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Application No.: US12603301Application Date: 2009-10-21
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Publication No.: US07986722B2Publication Date: 2011-07-26
- Inventor: Yu Higuchi , Kunimichi Omae
- Applicant: Yu Higuchi , Kunimichi Omae
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2008-271870 20081022; JP2009-234800 20091009
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S3/097

Abstract:
A method of manufacturing a nitride semiconductor light emitting element includes: forming a stacked layer body of a nitride semiconductor having a second conductive-type layer, a light emitting layer, and a first conductive-type layer stacked on a growth substrate in this order; forming a first Bragg reflector made of a dielectric multilayer film above the first conductive-type layer; forming a first electrode over the first Bragg reflector with the first electrode being electrically connected to the first conductive-type layer; bonding the stacked layer body to a supporting substrate via the first Bragg reflector and the first electrode; removing the growth substrate from the stacked layer body to expose the second conductive-type layer; and forming over the exposed second conductive-type layer a second electrode and a second Bragg reflector made of a dielectric multilayer film so that the second Bragg reflector faces the first Bragg reflector across the stacked layer body.
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