A control device is provided that flexibly controls a substrate processing apparatus for each product process. Four process recipes PM 1 to PM 4 are stored in a first storage unit 255a. Corresponding to each of the process recipes, a high temperature, a medium temperature, and a low temperature pre-recipe are stored in a second storage unit 255b. A process recipe determination unit 260 determines, in response to a recipe specified by the operator, a process recipe corresponding to the specified recipe from the first storage unit 255a. A stage temperature acquisition unit 265 acquires, from the determined process recipe, a stage temperature. A pre-recipe selection unit 270 selects, from the three types of pre-recipes stored in the second storage unit 255b, one pre-recipe corresponding to the stage temperature. Before the wafer W is deposition-processed, therefore, the PM may be well-conditioned according to the selected pre-recipe.