Invention Grant
US07987085B2 Method of accurate prediction of electrostatic discharge (ESD) performance in multi-voltage environment
有权
在多电压环境下精确预测静电放电(ESD)性能的方法
- Patent Title: Method of accurate prediction of electrostatic discharge (ESD) performance in multi-voltage environment
- Patent Title (中): 在多电压环境下精确预测静电放电(ESD)性能的方法
-
Application No.: US12032624Application Date: 2008-02-15
-
Publication No.: US07987085B2Publication Date: 2011-07-26
- Inventor: S. M. Sohel Imtiaz
- Applicant: S. M. Sohel Imtiaz
- Applicant Address: US CA San Jose
- Assignee: Micrel, Inc.
- Current Assignee: Micrel, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Sawyer Law Group, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The present invention relates generally to semiconductor wafer fabrication and more particularly but not exclusively to predictive, pre-fabrication methodologies for determining inefficiencies in an integrated circuit (IC) design. The present invention, in one or more implementations, provides an effective pre-production methodology for predicting the efficiency and behavior of a designed ESD protective circuit and testing the ESD protective circuit with a simulated IC. The method of the present invention yields predictive results that have been comparatively tested.
Public/Granted literature
- US20090210210A1 METHOD OF ACCURATE PREDICTION OF ELECTROSTATIC DISCHARGE (ESD) PERFORMANCE IN MULTI-VOLTAGE ENVIRONMENT Public/Granted day:2009-08-20
Information query