Invention Grant
- Patent Title: Stage device for a vacuum chamber
- Patent Title (中): 真空室的舞台装置
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Application No.: US10510082Application Date: 2003-04-02
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Publication No.: US07988136B2Publication Date: 2011-08-02
- Inventor: Ian Saunders
- Applicant: Ian Saunders
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Morgan, Lewis & Bockius LLP
- International Application: PCT/NL03/00247 WO 20030402
- International Announcement: WO03/083909 WO 20031009
- Main IPC: B25B1/00
- IPC: B25B1/00

Abstract:
The disclosure relates to a transfer stage for moving an object in a vacuum chamber in at least a plane of movement, including at least a first and a second rod each having a first and a second end, the first and second rod being connected one to the other with their first ends by a first hinge, the second end of the first rod being provided with a first hinged support and the second end of the second rod being provided with a second hinged support, the first and second hinged supports being roller supports and the first hinge being provided with a short stroke stage for the object. Particularly when using this transfer stage in lithography systems fast and reliable movements are possible.
Public/Granted literature
- US20080219805A1 Stage Device for a Vacuum Chamber Public/Granted day:2008-09-11
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