Invention Grant
- Patent Title: Slicing method
- Patent Title (中): 切片方法
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Application No.: US12310650Application Date: 2007-08-08
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Publication No.: US07988530B2Publication Date: 2011-08-02
- Inventor: Hiroshi Oishi , Daisuke Nakamata
- Applicant: Hiroshi Oishi , Daisuke Nakamata
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-257386 20060922
- International Application: PCT/JP2007/065502 WO 20070808
- International Announcement: WO2008/035513 WO 20080327
- Main IPC: B24B49/14
- IPC: B24B49/14

Abstract:
The present invention provides a slicing method comprising winding a wire around a plurality of grooved rollers and pressing the wire against an ingot to be sliced into wafers while supplying a slurry for slicing to the grooved rollers and causing the wire to travel, wherein a cooling speed of the ingot when a slicing depth is equal to or above ⅔ of a diameter is controlled to perform slicing by supplying a slurry for adjusting an ingot temperature to the ingot independently from the slurry for slicing while controlling a supply temperature only in a period from the moment that the slicing depth of the ingot reaches at least ⅔ of the diameter to end of slicing. As a result, the slicing method is provided, in which rapid cooling of the ingot in the time close to end of slicing the ingot can be alleviated when a wire saw is used to slice the ingot, and generation of a nano-topography can be thereby suppressed and further high quality wafers having a uniform thickness are obtained by slicing.
Public/Granted literature
- US20090253352A1 Slicing Method Public/Granted day:2009-10-08
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