Invention Grant
- Patent Title: Magneto-optical photoresist
- Patent Title (中): 磁光光刻胶
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Application No.: US11644927Application Date: 2006-12-21
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Publication No.: US07989152B2Publication Date: 2011-08-02
- Inventor: Vladimir Nikitin
- Applicant: Vladimir Nikitin
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies, Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies, Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Main IPC: G11B5/127
- IPC: G11B5/127
Abstract:
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment. The magneto-optical photoresist is also patterned by using a photo exposure, wherein the magnetic alignment provides a photo exposure alignment for the photo exposure.
Public/Granted literature
- US20080151207A1 Magneto-optical photoresist Public/Granted day:2008-06-26
Information query
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