Invention Grant
US07989257B2 Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the composition
失效
聚硅氮烷，聚硅氮烷的合成方法，半导体装置的制造用组合物以及使用该组合物的半导体装置的制造方法
- Patent Title: Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the composition
- Patent Title (中): 聚硅氮烷，聚硅氮烷的合成方法，半导体装置的制造用组合物以及使用该组合物的半导体装置的制造方法
-
Application No.: US12415309Application Date: 2009-03-31
-
Publication No.: US07989257B2Publication Date: 2011-08-02
- Inventor: Joo Hyeon Park , Yong Chang
- Applicant: Joo Hyeon Park , Yong Chang
- Applicant Address: KR Seoul
- Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Ladas & Parry LLP
- Priority: KR10-2008-0109287 20081105
- Main IPC: H01L51/40
- IPC: H01L51/40
Abstract:
Disclosed are polysilazane, a method of synthesizing the polysilazane, a composition for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using the composition. The polysilazane is synthesized through a reaction, under a catalyst, between dichlorosilane, trichlorosilane, and ammonia added in a reaction solvent as a reactant. In this instance, a polystyrene conversion weight average molecular weight of the polysilazane is about 2,000 to 30,000.
Public/Granted literature
Information query
IPC分类:
