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US07989506B2 Method and apparatus for dispersion of high-surface-area, low-bulk-density fumed silica 失效
用于分散高表面积，低体积密度的煅制二氧化硅的方法和装置

  • Patent Title: Method and apparatus for dispersion of high-surface-area, low-bulk-density fumed silica
  • Patent Title (中): 用于分散高表面积，低体积密度的煅制二氧化硅的方法和装置
  • Application No.: US11696232
    Application Date: 2007-04-04
  • Publication No.: US07989506B2
    Publication Date: 2011-08-02
  • Inventor: Paul A. Corbelli
  • Applicant: Paul A. Corbelli
  • Applicant Address: US NY Rochester
  • Assignee: Eastman Kodak Company
  • Current Assignee: Eastman Kodak Company
  • Current Assignee Address: US NY Rochester
  • Agent Chris P. Konkol; Andrew J. Anderson
  • Main IPC: B01F3/12
  • IPC: B01F3/12 ;  C01B33/141
Method and apparatus for dispersion of high-surface-area, low-bulk-density fumed silica
Abstract:
The present invention generally relates to methods of preparing stable colloidal dispersions of nanoparticulate size fumed silica particles. More particularly, the invention relates to a method of rapidly wetting and dispersing fumed silica powder for obtaining a coatable dispersion, particularly in the manufacture of inkjet media.
Abstract(Chinese):

本发明一般涉及制备纳米颗粒尺寸的煅制二氧化硅颗粒的稳定的胶态分散体的方法。 更具体地说，本发明涉及一种快速润湿和分散热解法二氧化硅粉末以获得可涂覆分散体的方法，特别是在喷墨介质的制造中。

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