Invention Grant
- Patent Title: Negative photosensitive polyimide polymer and uses thereof
- Patent Title (中): 负光敏聚酰亚胺聚合物及其用途
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Application No.: US11980103Application Date: 2007-10-30
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Publication No.: US07989578B2Publication Date: 2011-08-02
- Inventor: Chung-Jen Wu
- Applicant: Chung-Jen Wu
- Applicant Address: TW
- Assignee: Eternal Chemical Co., Ltd.
- Current Assignee: Eternal Chemical Co., Ltd.
- Current Assignee Address: TW
- Agency: Ladas & Parry LLP
- Priority: TW95140055A 20061030
- Main IPC: C08G73/10
- IPC: C08G73/10
Abstract:
The present invention relates to a negative photosensitive polyimide polymer having a repeating unit of formula (1) as a polymerized unit: wherein G, Q and P* are as defined in the specification. The polyimide polymer of the present invention is developable in an aqueous alkaline solution, and has the properties associated with an insulating layer and photoresist.
Public/Granted literature
- US20080103275A1 Negative photosensitive polyimide polymer and uses thereof Public/Granted day:2008-05-01
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