Invention Grant
- Patent Title: Semiconductor device including a deflected part
- Patent Title (中): 包括偏转部分的半导体装置
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Application No.: US11628976Application Date: 2005-06-03
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Publication No.: US07989855B2Publication Date: 2011-08-02
- Inventor: Mitsuru Narihiro
- Applicant: Mitsuru Narihiro
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2004-172846 20040610
- International Application: PCT/JP2005/010237 WO 20050603
- International Announcement: WO2005/122276 WO 20051222
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/336

Abstract:
This invention relates to a semiconductor device having a beam made of a semiconductor to which strain is introduced by deflection, and a current is permitted to flow in the beam.
Public/Granted literature
- US20070241414A1 Semiconductor Device and Manufacturing Process Therefor Public/Granted day:2007-10-18
Information query
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