Invention Grant
US07989881B2 Semiconductor device structure with a tapered field plate and cylindrical drift region geometry 有权
具有锥形场板和圆柱漂移区几何形状的半导体器件结构

  • Patent Title: Semiconductor device structure with a tapered field plate and cylindrical drift region geometry
  • Patent Title (中): 具有锥形场板和圆柱漂移区几何形状的半导体器件结构
  • Application No.: US11815861
    Application Date: 2006-02-07
  • Publication No.: US07989881B2
    Publication Date: 2011-08-02
  • Inventor: Theodore LetavicJohn Petruzzello
  • Applicant: Theodore LetavicJohn Petruzzello
  • Applicant Address: NL Eindhoven
  • Assignee: NXP B.V.
  • Current Assignee: NXP B.V.
  • Current Assignee Address: NL Eindhoven
  • International Application: PCT/IB2006/050398 WO 20060207
  • International Announcement: WO2006/085267 WO 20060817
  • Main IPC: H01L29/66
  • IPC: H01L29/66
Semiconductor device structure with a tapered field plate and cylindrical drift region geometry
Abstract:
A vertically oriented self terminating semiconductor device such as a discrete trench MOS device (10, 38) that includes a cylindrical drift region (18) that extend downward from a surface region to a substrate (11) and a dielectric region (20) that exponentially tapers outward from the cylindrical drift region as the drift region approaches the substrate. A field plate electrode (12) is disposed on the dielectric region. Alternatively, the gate electrode (40, 46) may be disposed on the dielectric region, optionally with an underlying field plate electrode (48).
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