Invention Grant
- Patent Title: Structure for making a top-side contact to a substrate
- Patent Title (中): 用于制造与衬底的顶侧接触的结构
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Application No.: US12359670Application Date: 2009-01-26
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Publication No.: US07989884B2Publication Date: 2011-08-02
- Inventor: Chun-Tai Wu , Ihsiu Ho
- Applicant: Chun-Tai Wu , Ihsiu Ho
- Applicant Address: US CA San Jose
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A semiconductor structure includes a starting semiconductor substrate having a recessed portion. A semiconductor material is formed in the recessed portion, and has a higher resistivity than the starting semiconductor substrate. A body region extends in the semiconductor material, and has a conductivity type opposite that of the semiconductor material. Source regions extend in the body region, and have a conductivity type opposite that of the body region. A gate electrode extends adjacent to but is insulated from the body region. A first interconnect layer extends over and is in contact with a non-recessed portion of the starting semiconductor substrate. The first interconnect layer and the non-recessed portion provide a top-side electrical contact to portions of the starting semiconductor substrate underlying the semiconductor material.
Public/Granted literature
- US20090194812A1 Structure for Making a Top-side Contact to a Substrate Public/Granted day:2009-08-06
Information query
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