Invention Grant
US07989904B2 Micro-electromechanical device and manufacturing method thereof 有权
微机电装置及其制造方法

Micro-electromechanical device and manufacturing method thereof
Abstract:
A micro-electromechanical device includes a substrate, a first patterned conductive layer, a second patterned conductive layer and a first patterned blocking layer. The first patterned conductive layer is disposed on the substrate. The second patterned conductive layer is disposed on the first patterned conductive layer. The first patterned blocking layer is connected with the first patterned conductive layer and the second patterned conductive layer. In addition, a method of manufacturing the micro-electromechanical device is also disclosed.
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