Invention Grant
- Patent Title: Micro-electromechanical device and manufacturing method thereof
- Patent Title (中): 微机电装置及其制造方法
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Application No.: US12016889Application Date: 2008-01-18
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Publication No.: US07989904B2Publication Date: 2011-08-02
- Inventor: Cheng-Chang Lee , Horng-Jou Wang , Zong-Ting Yuan , Chao-Jui Liang , Hsieh-Shen Hsieh , Huang-Kun Chen , Tai-Kang Shing
- Applicant: Cheng-Chang Lee , Horng-Jou Wang , Zong-Ting Yuan , Chao-Jui Liang , Hsieh-Shen Hsieh , Huang-Kun Chen , Tai-Kang Shing
- Applicant Address: TW Kuel San, Taoyuan Hsien
- Assignee: Delta Electronics Inc.
- Current Assignee: Delta Electronics Inc.
- Current Assignee Address: TW Kuel San, Taoyuan Hsien
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW96108095A 20070309
- Main IPC: H01L27/14
- IPC: H01L27/14

Abstract:
A micro-electromechanical device includes a substrate, a first patterned conductive layer, a second patterned conductive layer and a first patterned blocking layer. The first patterned conductive layer is disposed on the substrate. The second patterned conductive layer is disposed on the first patterned conductive layer. The first patterned blocking layer is connected with the first patterned conductive layer and the second patterned conductive layer. In addition, a method of manufacturing the micro-electromechanical device is also disclosed.
Public/Granted literature
- US20080217787A1 MICRO-ELECTROMECHANICAL DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2008-09-11
Information query
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