An immersion exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and a liquid, thereby exposing the substrate. A substrate stage mechanism includes a substrate stage to hold the substrate. An immersion unit supplies the liquid into a space between the substrate or the substrate stage and the projection optical system, and recovers the liquid from above the substrate or the substrate stage. A control unit controls the immersion unit to recover the liquid from above the substrate or the substrate stage, and then controls the substrate stage mechanism to move the substrate stage to a retreat position, in response to a shutoff request for requesting shutoff of electrical power supply to the substrate stage mechanism. The control unit executes, in response to the shutoff request, a special process according to a process being executed by the immersion exposure apparatus when the control unit has received the shutoff request, and then controls the immersion unit to recover the liquid from above the substrate stage.