Invention Grant
- Patent Title: IR-UV cut multilayer filter with dust repellent property
- Patent Title (中): 具有防尘性能的IR-UV切割多层过滤器
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Application No.: US12272153Application Date: 2008-11-17
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Publication No.: US07990616B2Publication Date: 2011-08-02
- Inventor: Munehiro Shibuya
- Applicant: Munehiro Shibuya
- Applicant Address: JP Tokyo
- Assignee: Epson Toyocom Corporation
- Current Assignee: Epson Toyocom Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-297611 20071116; JP2008-201556 20080805
- Main IPC: G02B5/22
- IPC: G02B5/22 ; B05D5/12

Abstract:
An optical multilayer filter having an inorganic thin film composed of a plurality of layers on a substrate includes a fluorinated organic silicon compound film formed on a surface of the inorganic thin film, a low-density formation section forming a part of the inorganic thin film, having one or more layers including the most superficial layer of the inorganic thin film, the one or more layers being formed of at least one of a low-density titanium oxide layer and a low-density silicon oxide layer, and a high-density formation section forming another part of the inorganic thin film, disposed between the low-density formation section and the substrate, having silicon oxide layers with a density higher than the low-density silicon oxide layer and titanium oxide layers with a density higher than the low-density titanium oxide layer in a stacked manner. A total thickness of the low-density formation section is equal to or smaller than 280 nm.
Public/Granted literature
- US20090128936A1 OPTICAL MULTILAYER FILTER, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS Public/Granted day:2009-05-21
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