Invention Grant
- Patent Title: Method and apparatus for detecting positions of electrode pads
- Patent Title (中): 用于检测电极焊盘位置的方法和装置
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Application No.: US12017642Application Date: 2008-01-22
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Publication No.: US07991219B2Publication Date: 2011-08-02
- Inventor: Yoshihito Marumo
- Applicant: Yoshihito Marumo
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-024238 20070202
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A method for detecting positions of a plurality of electrode pads of semiconductor chips formed on a semiconductor wafer includes: setting an imaging target region greater than a semiconductor chip on the semiconductor wafer; performing split imaging so as to entirely cover the imaging target region; and detecting positions of electrode pads of the semiconductor chip by processing images obtained by the split imaging. The split imaging is performed by using an imaging device which enlarges and images a region smaller than the imaging target region by one imaging.
Public/Granted literature
- US20090010525A1 METHOD AND APPARATUS FOR DETECTING POSITIONS OF ELECTRODE PADS Public/Granted day:2009-01-08
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