Invention Grant
US07991486B2 Process control apparatus rejecting disturbance applied to feedback loop
有权
过程控制装置拒绝对反馈回路施加的干扰
- Patent Title: Process control apparatus rejecting disturbance applied to feedback loop
- Patent Title (中): 过程控制装置拒绝对反馈回路施加的干扰
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Application No.: US12031185Application Date: 2008-02-14
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Publication No.: US07991486B2Publication Date: 2011-08-02
- Inventor: Hiroyuki Miyamoto , Takashi Sasaki
- Applicant: Hiroyuki Miyamoto , Takashi Sasaki
- Applicant Address: JP Tokyo
- Assignee: Yokogawa Electric Corporation
- Current Assignee: Yokogawa Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-034609 20070215
- Main IPC: G05B13/02
- IPC: G05B13/02

Abstract:
A process control apparatus for controlling a control target includes, but is not limited to, first and second control units. The first control unit is designed in a design environment unspecifying any period of disturbance. The first control unit performs a feedback control to the control target by using a setting value of the control target and a measured value of the control target. The first control unit is included in a feedback loop. The second control unit is also included in the feedback loop. The second control unit is designed by using an internal model principle. The second control unit rejects the disturbance, which is applied to the feedback loop, by using the measured value of the control target.
Public/Granted literature
- US20080200996A1 PROCESS CONTROL APPARATUS Public/Granted day:2008-08-21
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