Invention Grant
- Patent Title: Surface micromachined differential microphone
- Patent Title (中): 表面微机械差动麦克风
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Application No.: US11343564Application Date: 2006-01-31
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Publication No.: US07992283B2Publication Date: 2011-08-09
- Inventor: Ronald N. Miles
- Applicant: Ronald N. Miles
- Applicant Address: US NY Binghamton
- Assignee: The Research Foundation of State University of New York
- Current Assignee: The Research Foundation of State University of New York
- Current Assignee Address: US NY Binghamton
- Agency: Ostrolenk Faber LLP
- Agent Steven M. Hoffberg
- Main IPC: H04R31/00
- IPC: H04R31/00

Abstract:
A differential microphone having a perimeter slit formed around the microphone diaphragm that replaces the backside hole previously required in conventional silicon, micromachined microphones. The differential microphone is formed using silicon fabrication techniques applied only to a single, front face of a silicon wafer. The backside holes of prior art microphones typically require that a secondary machining operation be performed on the rear surface of the silicon wafer during fabrication. This secondary operation adds complexity and cost to the micromachined microphones so fabricated. Comb fingers forming a portion of a capacitive arrangement may be fabricated as part of the differential microphone diaphragm.
Public/Granted literature
- US20090016557A1 Surface micromachined differential microphone Public/Granted day:2009-01-15
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