Invention Grant
- Patent Title: Hydrogen sensor
- Patent Title (中): 氢传感器
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Application No.: US11467341Application Date: 2006-08-25
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Publication No.: US07992425B2Publication Date: 2011-08-09
- Inventor: Kevin Luongo , Shekhar Bhansali
- Applicant: Kevin Luongo , Shekhar Bhansali
- Applicant Address: US FL Tampa
- Assignee: University of South Florida
- Current Assignee: University of South Florida
- Current Assignee Address: US FL Tampa
- Agency: Smith & Hopen, P.A.
- Agent Michele L. Lawson
- Main IPC: G01N30/00
- IPC: G01N30/00 ; G01N27/12

Abstract:
A novel, resistance-based porous silicon sensor with Pd nano structures as the hydrogen sensing layer is presented. The sensor operates at room temperature. The hydrogen sensor of the present includes a p-Type Si substrate that is subjected to porous Si etching to form a nanoporous substrate. The substrate is then coated with a thin layer of Pd and annealed at 900 degrees C. This results in some Pd getting oxidized on porous Si and a thin PdO layer forms on the surface of the substrate. The sensor in accordance with the present invention exhibits an inverse relationship between increased hydrogen concentration versus resistance.
Public/Granted literature
- US20070108052A1 Hydrogen Sensor Public/Granted day:2007-05-17
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