Invention Grant
- Patent Title: Method of manufacturing liquid jet head, method of manufacturing piezoelectric element and liquid jet apparatus
- Patent Title (中): 制造液体喷头的方法，制造压电元件的方法和液体喷射装置
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Application No.: US12405984Application Date: 2009-03-17
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Publication No.: US07992972B2Publication Date: 2011-08-09
- Inventor: Toshinao Shinbo , Kazushige Hakeda , Koji Sumi , Tsutomu Nishiwaki
- Applicant: Toshinao Shinbo , Kazushige Hakeda , Koji Sumi , Tsutomu Nishiwaki
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: JP2008-067209 20080317; JP2008-332955 20081226
- Main IPC: B41J2/045
- IPC: B41J2/045
Abstract:
A method of manufacturing a piezoelectric element includes a piezoelectric layer forming step of sequentially and repeatedly performing a heat treatment step of applying a piezoelectric material containing lead to a lower electrode film at a relative humidity in the range of 30% to 50% Rh and then performing a heat treatment to form a piezoelectric precursor film and a crystallization step of firing the piezoelectric precursor film to form a piezoelectric film on the lower electrode film, thereby forming a piezoelectric layer.
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