Invention Grant
- Patent Title: Deposition sub-chamber with variable flow
- Patent Title (中): 具有可变流量的沉积子室
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Application No.: US11626328Application Date: 2007-01-23
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Publication No.: US07993457B1Publication Date: 2011-08-09
- Inventor: Peter Krotov , Colin F. Smith
- Applicant: Peter Krotov , Colin F. Smith
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: C23C16/458
- IPC: C23C16/458 ; C23F1/00 ; H01L21/306 ; C23C16/22 ; C23C16/06
Abstract:
An apparatus and method for depositing film on a substrate includes a plurality of conduits that allow by-product and reactant gases to flow past the edge of a substrate. The apparatus and process of the present invention has several advantages for enhanced chamber performance, particularly for micro-volume chambers using pulsed deposition layer processes.
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