Invention Grant
- Patent Title: Substrate-supporting device having continuous concavity
- Patent Title (中): 具有连续凹度的基板支撑装置
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Application No.: US12051769Application Date: 2008-03-19
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Publication No.: US07993462B2Publication Date: 2011-08-09
- Inventor: Satoshi Takahashi
- Applicant: Satoshi Takahashi
- Applicant Address: JP Tokyo
- Assignee: ASM Japan K.K.
- Current Assignee: ASM Japan K.K.
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/50 ; C23F1/00 ; H01L21/306

Abstract:
A substrate-supporting device has a top surface for placing a substrate thereon composed of a plurality of surfaces separated from each other and defined by a continuous concavity being in gas communication with at least one through-hole passing through the substrate-supporting device in its thickness direction. The continuous concavity is adapted to allow gas to flow in the continuous concavity and through the through-hole under a substrate placed on the top surface.
Public/Granted literature
- US20090239385A1 SUBSTRATE-SUPPORTING DEVICE HAVING CONTINUOUS CONCAVITY Public/Granted day:2009-09-24
Information query
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