Invention Grant
US07993487B2 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
有权
等离子体处理装置和测量等离子体中射频电流量的方法
- Patent Title: Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
- Patent Title (中): 等离子体处理装置和测量等离子体中射频电流量的方法
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Application No.: US11692340Application Date: 2007-03-28
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Publication No.: US07993487B2Publication Date: 2011-08-09
- Inventor: Yohei Yamazawa
- Applicant: Yohei Yamazawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McCelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-090278 20060329
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/00 ; C23C14/00

Abstract:
In the present invention, two coil-shaped probes each detecting the intensity of a magnetic field in a direction around a center axis of a processing space are provided in a process vessel of a plasma processing apparatus. Each of the probes detects an induced electromotive force generated in the coil, and a computer calculates an amount of radio-frequency current from the induced electromotive force, based on a predetermined calculation principle. A difference between the amounts of the radio-frequency current detected by the probes is calculated, and a loss radio-frequency current amount passing out of a plasma area between upper and lower electrodes is calculated, whereby the flow of the radio-frequency current in the plasma is known.
Public/Granted literature
- US20070227667A1 PLASMA PROCESSING APPARATUS AND METHOD OF MEASURING AMOUNT OF RADIO-FREQUENCY CURRENT IN PLASMA Public/Granted day:2007-10-04
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