Invention Grant
- Patent Title: Method of manufacturing magnetic recording medium
- Patent Title (中): 磁记录介质的制造方法
-
Application No.: US12636610Application Date: 2009-12-11
-
Publication No.: US07993536B2Publication Date: 2011-08-09
- Inventor: Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant: Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2008-317382 20081212
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
Public/Granted literature
- US20100147791A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM Public/Granted day:2010-06-17
Information query