Invention Grant
US07993538B2 Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
有权
通过能量刺激局部去除固体冷凝气层和通过这些层产生的固态化学反应形成图案
- Patent Title: Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
- Patent Title (中): 通过能量刺激局部去除固体冷凝气层和通过这些层产生的固态化学反应形成图案
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Application No.: US12287573Application Date: 2008-10-10
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Publication No.: US07993538B2Publication Date: 2011-08-09
- Inventor: Jene A. Golovchenko , Gavin M. King , Gregor M. Schurmann , Daniel Branton
- Applicant: Jene A. Golovchenko , Gavin M. King , Gregor M. Schurmann , Daniel Branton
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Agent Theresa A. Lober
- Main IPC: C23C14/34
- IPC: C23C14/34 ; B82B3/00
Abstract:
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.
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