Invention Grant
- Patent Title: Process for producing metallized aluminum nitride substrate
- Patent Title (中): 金属化氮化铝基板的制造方法
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Application No.: US11667603Application Date: 2005-11-10
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Publication No.: US07993699B2Publication Date: 2011-08-09
- Inventor: Yasuyuki Yamamoto , Masakatsu Maeda
- Applicant: Yasuyuki Yamamoto , Masakatsu Maeda
- Applicant Address: JP
- Assignee: Tokuyama Corporation
- Current Assignee: Tokuyama Corporation
- Current Assignee Address: JP
- Agency: The Webb Law Firm
- Priority: JP2004-328778 20041112
- International Application: PCT/JP2005/020649 WO 20051110
- International Announcement: WO2006/051881 WO 20060518
- Main IPC: B05D5/12
- IPC: B05D5/12 ; B05D3/00

Abstract:
A metallized aluminum substrate for mounting a semiconductor device such as LD or LED is provided and a metallized aluminum nitride substrate having excellent dimensional accuracy and high bonding strength of a wiring pattern. An intermediate material substrate is provided, comprising a sintered aluminum nitride substrate having on its surface a wiring pattern constituted of a conductor layer composed of a composition containing at least high-melting point metal powder, aluminum nitride powder and a sintering auxiliary agent for aluminum nitride is prepared. Then, the intermediate material substrate is fired while the sintered aluminum nitride obtained by sintering using a sintering auxiliary agent of the same kind as that of the sintering auxiliary agent contained in the composition is placed so as to be brought into contact with the conductor layer on the surface of the intermediate material substrate or so as to be present in the vicinity of the conductor layer.
Public/Granted literature
- US20080020224A1 Process For Producing Metallized Aluminum Nitride Substrate And Substrate Obtained Thereby Public/Granted day:2008-01-24
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