Invention Grant
- Patent Title: Method of forming a nano-structure and the nano-structure
- Patent Title (中): 形成纳米结构和纳米结构的方法
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Application No.: US11628793Application Date: 2005-06-08
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Publication No.: US07993706B2Publication Date: 2011-08-09
- Inventor: Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
- Applicant: Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
- Applicant Address: JP Saitama
- Assignee: Riken
- Current Assignee: Riken
- Current Assignee Address: JP Saitama
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2004-169398 20040608
- International Application: PCT/JP2005/010899 WO 20050608
- International Announcement: WO2005/121019 WO 20051222
- Main IPC: B82B3/00
- IPC: B82B3/00 ; C01B33/12 ; H01L21/027
Abstract:
A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
Public/Granted literature
- US20080050564A1 Method of Forming a Nano-Structure and the Nano-Structure Public/Granted day:2008-02-28
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