Invention Grant
- Patent Title: Multilayer active mask lithography
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Application No.: US12287682Application Date: 2008-10-10
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Publication No.: US07993800B2Publication Date: 2011-08-09
- Inventor: Roderick A. Hyde , Nathan P. Myhrvold
- Applicant: Roderick A. Hyde , Nathan P. Myhrvold
- Applicant Address: US WA Bellevue
- Assignee: The Invention Science Fund I, LLC
- Current Assignee: The Invention Science Fund I, LLC
- Current Assignee Address: US WA Bellevue
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03C5/00 ; H01L21/22
Abstract:
An active mask emits a patterned energy flux in response to an energy input.
Public/Granted literature
- US20090117475A1 Multilayer active mask lithography Public/Granted day:2009-05-07
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