Invention Grant
- Patent Title: TARC material for immersion watermark reduction
- Patent Title (中): TARC材料用于浸没水印缩减
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Application No.: US11324588Application Date: 2006-01-03
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Publication No.: US07993808B2Publication Date: 2011-08-09
- Inventor: Ching-Yu Chang
- Applicant: Ching-Yu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer.
Public/Granted literature
- US20070077517A1 Novel TARC material for immersion watermark reduction Public/Granted day:2007-04-05
Information query
