Invention Grant
- Patent Title: (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods
- Patent Title (中): （甲基）丙烯酸酯化合物，光敏聚合物，抗蚀剂组合物和相关方法
-
Application No.: US12314828Application Date: 2008-12-17
-
Publication No.: US07993810B2Publication Date: 2011-08-09
- Inventor: Sang-Jun Choi , Youn-Jin Cho , Seung-Wook Shin , Hye-Won Kim
- Applicant: Sang-Jun Choi , Youn-Jin Cho , Seung-Wook Shin , Hye-Won Kim
- Applicant Address: KR Gumi-si Kyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si Kyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2007-0132696 20071217
- Main IPC: G03C7/30
- IPC: G03C7/30 ; G03F7/039 ; C08F20/18
Abstract:
A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula I, R1 is hydrogen or methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, R3 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR.
Public/Granted literature
Information query
