Invention Grant
- Patent Title: Semiconductor device and fabrication method thereof
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US12412444Application Date: 2009-03-27
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Publication No.: US07993970B2Publication Date: 2011-08-09
- Inventor: Shiann-Tsong Tsai
- Applicant: Shiann-Tsong Tsai
- Applicant Address: TW Hsinchu
- Assignee: UTAC (Taiwan) Corporation
- Current Assignee: UTAC (Taiwan) Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Edwards Angell Palmer & Dodge LLP
- Agent Steven M. Jensen; Peter F. Corless
- Priority: TW97111224A 20080328; TW97122489A 20080617
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A semiconductor device and a method of manufacturing the same are disclosed. The method is carried out by forming solder pads on a substrate by wet etching, flipping a semiconductor chip having a plurality of connection bumps formed on an active surface of the semiconductor chip for the connection bumps to be mounted by compression on the solder pads of the substrate correspondingly, at a temperature of the compression between the connection bumps and the solder pads lower than the melting points of the solder pads and the connection bumps, so as to allow the semiconductor chip to be engaged with and electrically connected to the substrate through the connection bumps and the solder pads, thereby enhancing the bonding strength of the solder pads and the connection bumps and increasing the fabrication reliability.
Public/Granted literature
- US20090243096A1 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2009-10-01
Information query
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